Micro- and Nano-Engineering MNE 97 International Conference on Micro- and NanofabricationHATZAKIS, M; GOGOLIDES, E.Microelectronic engineering. 1998, Vol 41-42, issn 0167-9317, 663 p.Conference Proceedings

Calibration of transfer standards for SPMGAO-FENG; PENG, G.-S; KOENDERS, L et al.Microelectronic engineering. 1998, Vol 41-42, pp 615-618, issn 0167-9317Conference Paper

Construction of microcolumn system and its application to nanolithographyLEE, Y. J; KANG, S. H; KIM, D. H et al.Microelectronic engineering. 1998, Vol 41-42, pp 485-488, issn 0167-9317Conference Paper

Fabrication of Si nanodevices by optical lithography and anisotropic etchingTSOUKALAS, D; NORMAND, P; AIDINIS, C et al.Microelectronic engineering. 1998, Vol 41-42, pp 523-526, issn 0167-9317Conference Paper

Fabrication of microelectron gun arrays using laser micromachiningCHOI, S. S; JUNG, M. Y; KIM, D. W et al.Microelectronic engineering. 1998, Vol 41-42, pp 167-170, issn 0167-9317Conference Paper

Interferometric lithography : from periodic arrays to arbitrary patternsBRUECK, S. R. J; ZAIDI, S. H; CHEN, X et al.Microelectronic engineering. 1998, Vol 41-42, pp 145-148, issn 0167-9317Conference Paper

Lifetime enhancement of a multicusp ion source for lithographyLEE, Y; GOUGH, R. A; KUNKEL, W. B et al.Microelectronic engineering. 1998, Vol 41-42, pp 241-244, issn 0167-9317Conference Paper

Nanofabrication by direct epitaxial growthERES, G; HUI, F. Y. C; THUNDAT, T. G et al.Microelectronic engineering. 1998, Vol 41-42, pp 519-522, issn 0167-9317Conference Paper

Si nanostructures formed by pattern-dependent oxidationNAGASE, M; FUJIWARA, A; YAMAZAKI, K et al.Microelectronic engineering. 1998, Vol 41-42, pp 527-530, issn 0167-9317Conference Paper

Measurement capabilities of optical 3D-sensors for MST applicationsBRAND, U; FLÜGGE, J.Microelectronic engineering. 1998, Vol 41-42, pp 623-626, issn 0167-9317Conference Paper

Absorber edge effect in proximity X-ray lithographySIMON, G; CHEN, Y; HAGHIRI-GOSNET, A. M et al.Microelectronic engineering. 1998, Vol 41-42, pp 297-300, issn 0167-9317Conference Paper

Complete manufacturability of sub-wavelength lithography using optical enhancementsMCCALLUM, M; LUCAS, K; KLING, M et al.Microelectronic engineering. 1998, Vol 41-42, pp 87-90, issn 0167-9317Conference Paper

Illuminator design for the printing of regular contact patternsBURKHARDT, M; YEN, A; PROGLER, C et al.Microelectronic engineering. 1998, Vol 41-42, pp 91-96, issn 0167-9317Conference Paper

Mesoscale thermal infrared sourcesGIRAUD, S. O. C; HASKO, D. G.Microelectronic engineering. 1998, Vol 41-42, pp 579-582, issn 0167-9317Conference Paper

Microlithography in midlife crisisAUSSCHNITT, C. P.Microelectronic engineering. 1998, Vol 41-42, pp 41-46, issn 0167-9317Conference Paper

Monodisperse aerosol particle deposition : Prospects for nanoelectronicsPROST, W; KRUIS, F. E; OTTEN, F et al.Microelectronic engineering. 1998, Vol 41-42, pp 535-538, issn 0167-9317Conference Paper

Monte Carlo simulation of the growth of metallic quantum dotsBOERO, M; MULHERAN, P. A; INKSON, J. C et al.Microelectronic engineering. 1998, Vol 41-42, pp 515-518, issn 0167-9317Conference Paper

Scanning electron microscope matching and calibration for dimensional metrologyMARCHMAN, H.Microelectronic engineering. 1998, Vol 41-42, pp 597-602, issn 0167-9317Conference Paper

Software for temperature simulation (TEMPTATION) in electron-beam lithographyBABIN, S; KUZMIN, I. Yu; SERGEEV, G et al.Microelectronic engineering. 1998, Vol 41-42, pp 191-194, issn 0167-9317Conference Paper

The future of Lithography after 193 nm opticsMACKAY, R. S.Microelectronic engineering. 1998, Vol 41-42, pp 71-74, issn 0167-9317Conference Paper

Analysis of sub-wavelength sized OPC featuresADAM, K; NEUREUTHER, A. R; SOCHA, R et al.Microelectronic engineering. 1998, Vol 41-42, pp 137-140, issn 0167-9317Conference Paper

Coulomb blockade nanothermometerKAUPPINEN, J. P; PEKOLA, J. P.Microelectronic engineering. 1998, Vol 41-42, pp 503-506, issn 0167-9317Conference Paper

Mechanical modeling of ion beam lithography masksFISHER, A; TEJEDA, R; SPRAGUE, M et al.Microelectronic engineering. 1998, Vol 41-42, pp 245-248, issn 0167-9317Conference Paper

Piezoresistive sensors on AFM cantilevers with atomic resolutionJUMPERTZ, R; HART, A. V. D; OHLSSON, O et al.Microelectronic engineering. 1998, Vol 41-42, pp 441-444, issn 0167-9317Conference Paper

Silicon single-electron memory structureSTONE, N. J; AHMED, H.Microelectronic engineering. 1998, Vol 41-42, pp 511-514, issn 0167-9317Conference Paper